The SGM3 beamline on ASTRID2
End-station for angle-resolved photoemission (ARPES).
The ARPES end station is equipped with four connected chambers allowing transfer in UHV between two preparation chambers and a measurement one, two load-locks and two UHV suitcases. The system is in particularly well suited for measurements of the electronic structure along arbitrary direction in k|| space, Fermi surface mapping, bulk bands mapping.
The end station allows:
- ARPES multi channel detection with energy resolution better than 15 meV and variable angular resolution
- 6 degrees of freedom manipulator for ARPES measurements (30-900 K)
- in situ sample preparation (sputtering, annealing 180-1800 K, chemical treatment) and cleaving
- in situ STM
- in situ Auger spectroscopy
- in situ epitaxial growth followed by RHEED
In this setup a main chamber is dedicated to angle-resolved photoemission spectroscopy exploiting a Phoibos 150 spectrometer. The motions of the manipulators and several settings of the beamline and acquisition modes are motorized and automatic scans can be performed. Acquisition and online analysis are available using Igor Pro (WaveMatrix). Alkali metals can be evaporated while acquiring ARPES. In this chamber LEED measurements can be performed on the 6 axis manipulator and on the preparation chamber manipulator. The set-up is also equipped with three different preparation chambers. One of them (Si-Chamber) is exclusively dedicated to cleaning and preparation of Si surfaces and growth of ??-layers. Another preparation chamber (PC) equipped with an Aarhus STM allows for storage of up to 10 samples and standard cleaning techniques (sputtering, temperature treatments range 180-1800 K, gas lines and deposition - e.g. alkali metals and low temperature evaporation metals). The third preparation chamber (MBE) is specifically dedicated to epitaxial growth (temperature ranges 180-1000 K) and can be equipped with a RHEED apparatus and a high temperature socket for cleaning of tungsten substrates. Standard sample preparation equipment is available also here together with e-beam evaporators. Two load-locks allow the loading of samples in UHV in 20 min time on both the PC and the MBE chambers. Two UHV suitcases can be connected to the system instead of the load-locks allowing transfer of samples in vacuum between UHV chambers in different locations.
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Last Modified 28 August 2018