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EU-Japan Joint Symposium on Plasma Processing

21-22 July, 2003
The Manne Siegbahn Laboratory, University of Stockholm

Programme

Monday July 21, 2003

09.15 - 09.30	Nigel Mason The Open University	Opening and Welcome
09.30 - 10.10	Hitoshi Itoh ASET	ASET’s activities in a reduction of PFC gases and the energy consumption in the multi-layer interconnection technology
10.10 - 10.50	Hiroyuki Shimogaki University of Tokyo	Plasma processing to help prevent global warming
10.50 - 11.20	Coffee
11.20 - 12.00	Bill Graham Queen’s University Belfast	Characterisation of electronegative inductively coupled discharges
12.00 - 12.40	Zoran Petrovic Institute of Physics Belgrade	Calculation of transport coefficients, relaxation of swarm properties and distribution functions: a gap between plasma models and atomic collision data
12.40 – 14.00	Lunch
14.00 - 14.40	Moritaka Nakamura ASET	Study of surface reactions in SiO2 etching by mass-separated CFx+ ion beam
14.40 - 15.20	Ichiro KatoASET	Ion-beam bombardment effect of borazine-siloxane polymer surface treatment
15.20 - 15.50	Tea
15.50 - 16.30	Nick Braithwaite The Open University	On the control of low pressure plasmas for processing
16.30 - 17.10	Kazuaki Kurihara ASET	Study of Si and SiO2 etching by plasma-beam irradiation
17.10 - 17.35	Masaru Hori Nagoya University	Development of a new etching system with PFC zero-emission using solid source of PFC and atmospheric plasma-synthesis of PFC in exhaust gases
17.35 - 18.00	Kenji Furuya Kyushu University	Quantitative analysis of CF₄ produced in the SiO₂ etching process by c-C₄F₈, C₃F₈, and C₂F₆ plasmas using in-situ mass spectrometry

Tuesday July 22, 2003

09.15 - 09.45	Nigel Mason The Open University	Atomic and molecular data for plasma processing: Challenges and new opportunities
09.45 – 10.15	Annemie Bogaerts University of Antwerp	Plasma modelling: overview of current activities
10.15 - 10.45	Tilmann Märk University of Innsbruck	Kinetics and energetics of electron induced ionization in plasmas
10.45 - 11.15	Jonathan Tennyson University College London	Calculating electron interactions with radical species
11.15 - 11.45	Coffee
11.45 - 12.25	Hiroshi TanakaSophia University	Electron-molecule collision cross sections for plasma processing gases
12.25 - 13.00	Hideo SugaiNagoya University	Challenges in plasma technologies in the Nagoya university COE program
13.00 – 14.00	Lunch
14.00 - 14.40	Jean-Paul Booth Ecole Polytechnique	Diagnostics of radio-frequency plasmas for plasma processing
14.40 – 15.30	Discussion
15.30	END