Modification Of Thin Molecular Films By Low-Energy Electrons

P. Swiderek, W. Michaelis, C. Jäggle

Fachbereich 02
Universität Bremen, Leobener Str.
NW2, 28359 Bremen, Germany

Interest in the chemical modification of adsorbates and thin molecular films at surfaces by exposure to low-energy electrons is increasing. This concerns not only the curing of coatings and lithographic techniques such as proximity printing, i.e. exposure of a surface to lowenergy electrons through a mask [1], but also reactions induced by the current under the tip of the scanning tunneling microscope (STM) [2]. Examples have shown that products are sometimes formed with surprising selectivity [3]. On the other hand, the underlying elementary reaction steps are often not well established. This, on the other hand, is essential to achieve reaction control using low-energy electron beams. Therefore, basic mechanistic studies are needed to complement present and to form a foundation for future technical developments.

This contribution will present recent work in this direction concerning the identification of products and reaction sequences and the measurement of reactive cross sections [4] in thin molecular films exposed to low-energy electrons.
 

References
[1] C.David, H.U.Müller, B.Völkel, M.Grunze, Microelectric Engineering 30, 57 (1996).
[2] S.-W.Hla, L.Bartels, G.Meyer, K.-H.Rieder, Phys.Rev.Lett. 85, 2777 (2000).
[4] W.Eck, V.Stadler, W.Geyer, M.Zharnikov, A.Gölzhäuser, M.Grunze, Adv.Mat. 12, 805 (2000).
[3] P.Swiderek, M.C.Deschamps, M.Michaud, L.Sanche, J.Phys.Chem. B 108, 11850 (2004).